| 摘要 |
<p>With a coating-film-forming coating agent (51) used as a resist consisting of a main component such as cyclorubber-bisazide and a photosensitive material, deposition (52) deposited on the coating film of the coating agent (51) formed on an in-chamber component (50) is immersed in a release liquid such as acetone along with the in-chamber component (50) removed from within a chamber (22) to thereby separate the deposition still kept attached to the coating film from the component (50) concurrently with the release of the coating film.</p> |
