发明名称 Edge electrode for characterization of semiconductor wafers
摘要 A conductive conformable braided wire is used as the edge electrode for material characterization of a semiconductor wafer. The braided wire is adapted to contact the perimeter of the n-GaN layer using a retractable support structure that alternately places the electrode in contact with the edge of the n-GaN layer and retracts it during repeated cycles of operation to test a plurality of similar wafers. The braided wire produced a very stable and higher electrical contact than any prior-art edge electrode.
申请公布号 US9442133(B1) 申请公布日期 2016.09.13
申请号 US201313895654 申请日期 2013.05.16
申请人 BRUKER NANO INC. 发明人 Chen Dong;Guenther Bryan;Fagg Henry;Duran Jaime
分类号 G01R1/06;G01R31/44;G01R31/26;G01R31/02;G09G3/00;G01R1/073 主分类号 G01R1/06
代理机构 代理人 Durando Antonio R.
主权项 1. A conductive edge electrode for characterizing a semiconductor material, comprising: a conductive conformable electrode adapted to contact a perimeter of a layer of the semiconductor material; and a support structure adapted to place the electrode in contact with said layer and to separate the electrode from the layer for repeated cycles of operation with a plurality of samples; wherein, during each of said repeated cycles of operation, said contact of the electrode is stationary in relation to the layer of semiconductor material.
地址 Santa Barbara CA US
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