发明名称 |
Edge electrode for characterization of semiconductor wafers |
摘要 |
A conductive conformable braided wire is used as the edge electrode for material characterization of a semiconductor wafer. The braided wire is adapted to contact the perimeter of the n-GaN layer using a retractable support structure that alternately places the electrode in contact with the edge of the n-GaN layer and retracts it during repeated cycles of operation to test a plurality of similar wafers. The braided wire produced a very stable and higher electrical contact than any prior-art edge electrode. |
申请公布号 |
US9442133(B1) |
申请公布日期 |
2016.09.13 |
申请号 |
US201313895654 |
申请日期 |
2013.05.16 |
申请人 |
BRUKER NANO INC. |
发明人 |
Chen Dong;Guenther Bryan;Fagg Henry;Duran Jaime |
分类号 |
G01R1/06;G01R31/44;G01R31/26;G01R31/02;G09G3/00;G01R1/073 |
主分类号 |
G01R1/06 |
代理机构 |
|
代理人 |
Durando Antonio R. |
主权项 |
1. A conductive edge electrode for characterizing a semiconductor material, comprising:
a conductive conformable electrode adapted to contact a perimeter of a layer of the semiconductor material; and a support structure adapted to place the electrode in contact with said layer and to separate the electrode from the layer for repeated cycles of operation with a plurality of samples; wherein, during each of said repeated cycles of operation, said contact of the electrode is stationary in relation to the layer of semiconductor material. |
地址 |
Santa Barbara CA US |