| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus which can improve utilization efficiency of film deposition material.SOLUTION: This invention relates to a film deposition apparatus 1 which deposits a film on a substrate 11 in a vacuum chamber 10. The vacuum chamber 10 is divided into a transportation part 10a which transports the substrate 11, a material installation part 10b in which film deposition material Ma is installed, and a film deposition part 10c which is provided between the transportation part 10a and the material installation part 10b. In the film deposition part 10c, an overhang portion 21 in which an edge part on a transportation part 10a side is projected to the outside is formed on at least one of a pair of facing walls in a transportation direction A of the substrate 11. In the transportation direction A of the substrate 11, an opening width L1 on the transportation part 10a side of the film deposition part 10c is larger than an opening width L2 on a material installation part 10b side. |
