发明名称 液処理装置
摘要 A liquid processing apparatus according to the present disclosure includes: a substrate holding unit configured to horizontally hold a substrate; a rotation driving unit configured to rotate the substrate holding unit about a vertical axis; a processing liquid supply unit configured to supply a processing liquid to the substrate while the substrate is being rotated; an upper guide ring and a lower guide ring which are configured to be rotated together with the substrate holding unit, to surround the substrate, to be arranged vertically to overlap each other with a gap therebetween, and to guide the processing liquid scattered from the substrate; and a rotating cup configured to be rotated together with the substrate holding unit, and to receive and downwardly guide the guided processing liquid.
申请公布号 JP6051919(B2) 申请公布日期 2016.12.27
申请号 JP20130030214 申请日期 2013.02.19
申请人 東京エレクトロン株式会社 发明人 水野 剛資
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址
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