发明名称 Triode
摘要 A triode includes a semiconductor, a deep n-well, a p-well, an n+ doping region, and a p+ doping region. The deep n-well is disposed adjacent to the semiconductor substrate. The p-well is included in the deep n-well and serves as a collector region of the triode. The n+ doping region serves as a base region of the triode. The p+ doping region serves as an emitter region of the triode. The deep n-well is coupled to the n+ doping region.
申请公布号 US9472657(B2) 申请公布日期 2016.10.18
申请号 US201414494883 申请日期 2014.09.24
申请人 Fitipower Integrated Technology, Inc. 发明人 Cheng Chih-Nan
分类号 H01L29/73;H01L29/747 主分类号 H01L29/73
代理机构 代理人 Ma Zhigang
主权项 1. A triode, comprising: a semiconductor substrate; a deep n-well adjacent to the semiconductor substrate; a p-well serving as a collector region of the triode; an n+ doping region serving as a base region of the triode; and a p+ doping region serving as an emitter region of the triode; wherein the deep n-well is coupled to the n+ doping region; wherein a first metal wire extends from the p+ doping region to receive an emitter voltage, a second metal wire extends from the n+ doping region to receive a base voltage, a third metal wire extends from the p-well to receive a collector voltage, and a fourth metal wire extends from the deep n-well to receive the emitter voltage.
地址 Hsinchu TW