| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a maskless exposure apparatus superior in energy efficiency by facilitating adjustment. <P>SOLUTION: The maskless exposure apparatus is formed by: arranging to incline at an angle of θ to a Y direction moving a stage 4 a rectangular spatial optical modulator arranging to juxtapose m micro mirrors 21 having p of length of one side in a row direction by mutually spacing gaps g and n micro mirrors in a line direction orthogonal to the row direction; and positioning a second spatial optical modulator 2B in an X direction orthogonal to the Y direction to a first spatial optical modulator 2A by setting an imperfect region of the second spatial optical modulator 2B inclined at the angle of θ to the Y direction to the imperfect region in which the number of the micro mirrors 21 of the Y direction arranged on the first spatial optical modulator 2A is not sufficient for the number of times k of overlapping necessary for exposure so that the sum s of the number of the micro mirrors 21 of the Y direction of the first and second spatial optical modulators 2A, 2B exceeds the number of times k of overlapping necessary for exposure. <P>COPYRIGHT: (C)2009,JPO&INPIT |
