| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus for injecting atmospheric plasma with a simple and easy configuration, and processing a material with a high degree of hardness. <P>SOLUTION: The plasma treatment apparatus 100 having two openings 2i and 2o at both ends includes: a tube part 2 formed of a copper tube; a high frequency power source 3; a matching circuit 3m; two connection terminals 3f-1 and 3f-2; a shield 4; a gas mixing part 5; and a fixed base 6. In this apparatus, sulfur hexafluoride (SF<SB>6</SB>) is injected onto the surface of a treated material S formed of a conductor placed on and grounded to the fixed base 6 together with the plasmatized argon stream. Almost all of the matching circuit 3m, the connection terminals 3f-1 and 3f-2, and the tube part 2 are shielded by the shield 4. In the gas mixing part 5, a flow path of sulfur hexafluoride (SF<SB>6</SB>) provided in the vicinity of the opening 2o of the tube part 2 is formed. Sulfur hexafluoride (SF<SB>6</SB>) contacting with the plasmatized argon is decompsoed to form a fluoride ion (F<SP>-</SP>) and/or a fluorine atom (F), and the surface of the treated material S is etched. <P>COPYRIGHT: (C)2009,JPO&INPIT |
