发明名称 |
Methods and apparatus for process abatement |
摘要 |
In a first aspect, a first abatement apparatus is provided. The first abatement apparatus includes (1) an oxidation unit adapted to receive an effluent stream from a semiconductor device manufacturing chamber; (2) a first water scrubber unit adapted to receive the effluent stream from the oxidation unit; and (3) a catalysis unit adapted to receive the effluent stream from the first water scrubber unit. Numerous other aspects are provided.
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申请公布号 |
US2007086931(A1) |
申请公布日期 |
2007.04.19 |
申请号 |
US20060452188 |
申请日期 |
2006.06.13 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
RAOUX SEBASTIEN;KINGSTON BRIAN;CURRY MARK;CLARK DANIEL;VERMEULEN ROBBERT;FLIPPO BELYNDA;HOLST MARK;TSU STEVE;LIN KEVIN;MCINTOSH MONIQUE |
分类号 |
B01D53/34;B01D53/46;B01D53/86 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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