| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt capable of manufacturing a resist pattern of good line edge roughness (LER).SOLUTION: There are provided a salt represented by the formula (I). (I), where Qand Qis each a fluorine atom or a perfluoroalkyl group, Rand Ris each a hydrogen atom, a fluorine atom or a perfluoroalkyl group, z is an integer of 0 to 6, Lis a group represented by the formula (b1-1) or the like, * represents a binding hand with -CRR, Land Lare each a single bond or a saturated hydrocarbon group, the total number of hydrocarbon atoms of Land Lis 22 or less, Ris a hydrogen atom, a fluorine atom, an alkyl group to the like, Ris a fluorinated alkyl group, Lis a single bond, an alkanediyl group or the like, Rrepresents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom and Zrepresents an organic cation.SELECTED DRAWING: None |
