| 摘要 |
A thinner composition prevents photoresist from drying at the tip of a photoresist spraying nozzle during a semiconductor process. When the spraying nozzle is not used, the thinner composition that includes two or more solvents having a different volatility, specifically a mixture solvent including a first solvent consisting of an alkyl acetate compound and a second solvent consisting of an ether compound and that optionally comprises a third solvent consisting of a cycloketone, compound is contained in a solvent bath to induce volatilization of the thinner composition, thereby effectively inhibiting photoresist from drying.
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