发明名称 |
COMPOSITION FOR FORMING A SILICON FILM AND METHOD FOR FORMING A SILICON FILM |
摘要 |
There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily. <IMAGE>
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申请公布号 |
EP1551057(A1) |
申请公布日期 |
2005.07.06 |
申请号 |
EP20030792692 |
申请日期 |
2003.08.15 |
申请人 |
JSR CORPORATION |
发明人 |
MATSUKI, YASUO;IWASAWA, HARUO;KATO, HITOSHI |
分类号 |
H01L21/208;C23C24/10;C23C26/02;H01L31/09;H01L31/18;(IPC1-7):H01L21/208 |
主分类号 |
H01L21/208 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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