| 发明名称 | Deflection measuring device and deflection measuring method | ||
| 摘要 | According to one embodiment, a deflection measuring device that irradiates an effective region of a pattern transfer plate on which a pattern is formed, with parallel lights from at least two directions, and detects interference fringes of the parallel lights reflected from the effective region. | ||
| 申请公布号 | US9459093(B2) | 申请公布日期 | 2016.10.04 |
| 申请号 | US201414296638 | 申请日期 | 2014.06.05 |
| 申请人 | Kabushiki Kaisha Toshiba | 发明人 | Sato Hidenori;Komine Nobuhiro |
| 分类号 | G01B11/16;G01B11/24 | 主分类号 | G01B11/16 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A deflection measuring device, comprising: a light source that generates measurement light; a beam splitter that splits the measurement light; mirrors that convert the split measurement light into parallel lights and irradiate an effective region of a pattern transfer plate on which a cyclic device pattern is formed, with the parallel lights from at least two directions; and a detector that detects interference fringes of the parallel lights reflected simultaneously from the effective region, the interference fringes being generated based on differences from each other in angle of planar wave of the parallel lights. | ||
| 地址 | Minato-ku JP | ||