发明名称 PROCESSING LIQUID CIRCULATION TYPE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a processing liquid circulation type processing system capable of injecting a surfactant of a predetermined concentration into pure water even if a flow rate of pure water to be supplied to a processing device is varied.SOLUTION: The processing liquid circulation type processing system comprises: a processing liquid supply device by which a processing liquid with a predetermined concentration is manufactured by adding a surfactant to pure water and supplied to a processing device; the processing device which processes a work piece held by a chuck table while supplying the processing liquid to the work piece; and a pure water refining device by which pure water is refined by removing an impurity containing processed waste and the surfactant from the processing liquid discharged from the processing device and the refined pure water is supplied to the processing liquid supply device. The processing liquid supply device includes: a pure water flow passage in which pure water flows; a flowmeter for measuring a flow rate in the pure water flow passage; and surfactant supply means which is located at a downstream side of the flowmeter and supplies the surfactant to the pure water flow passage. The surfactant supply means supplies such a predetermined quantity of surfactant that the surfactant becomes a predetermined concentration with respect to the flow rate of the pure water, and the pure water flowing in the pure water flow passage and the surfactant are mixed by a turbulent flow.SELECTED DRAWING: Figure 3
申请公布号 JP2016165771(A) 申请公布日期 2016.09.15
申请号 JP20150046664 申请日期 2015.03.10
申请人 DISCO ABRASIVE SYST LTD 发明人 UCHIDA MASAKI;YOSHIDA MIKI;ARAI MASARU
分类号 B23Q11/10;B23Q11/00;B24B55/03;B28D5/02 主分类号 B23Q11/10
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