SEMICONDUCTOR THIN FILM MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor thin film manufacturing method which can form a semiconductor thin film by photonic curing at lower temperature and in a short time.SOLUTION: A semiconductor thin film manufacturing method comprises the steps of: making a precursor ink where a compound as a precursor of a compound semiconductor is dissolved in a solvent and coating the substrate with the precursor ink; and irradiating pulsed light on the precursor ink coated on the substrate. By doing this, a semiconductor thin film having a photoelectric conversion function is formed. The semiconductor thin film can be used for a photoelectric conversion layer and the like of a solar cell.SELECTED DRAWING: None