发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE |
摘要 |
Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black. |
申请公布号 |
US2016320529(A1) |
申请公布日期 |
2016.11.03 |
申请号 |
US201615209870 |
申请日期 |
2016.07.14 |
申请人 |
FUJIFILM Corporation |
发明人 |
KASHIWAGI Daisuke;ANDOU Takeshi;YAMADA Satoru;KAWABE Yasumasa;TOMEBA Hisamitsu |
分类号 |
G02B1/04;G02B5/22;G02F1/1335;C08F220/16;C08F220/36;H01L51/00;C08F220/28;C08F212/14;G03F7/039;G03F7/16;G03F7/20;G03F7/32;G03F7/00;H01L27/32;H01L51/52;H01L27/146;H01L51/56;G02B5/20 |
主分类号 |
G02B1/04 |
代理机构 |
|
代理人 |
|
主权项 |
1. A photosensitive resin composition comprising:
(Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black. |
地址 |
Tokyo JP |