发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE
摘要 Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.
申请公布号 US2016320529(A1) 申请公布日期 2016.11.03
申请号 US201615209870 申请日期 2016.07.14
申请人 FUJIFILM Corporation 发明人 KASHIWAGI Daisuke;ANDOU Takeshi;YAMADA Satoru;KAWABE Yasumasa;TOMEBA Hisamitsu
分类号 G02B1/04;G02B5/22;G02F1/1335;C08F220/16;C08F220/36;H01L51/00;C08F220/28;C08F212/14;G03F7/039;G03F7/16;G03F7/20;G03F7/32;G03F7/00;H01L27/32;H01L51/52;H01L27/146;H01L51/56;G02B5/20 主分类号 G02B1/04
代理机构 代理人
主权项 1. A photosensitive resin composition comprising: (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.
地址 Tokyo JP