| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound which enables to obtain a highly sensitive photoresist composition which forms a fine pattern with excellent resolution and good rectangular shape and is capable of obtaining good resist characteristics even when the acid generated by an acid generator is weak. <P>SOLUTION: The polymer compound which exhibits changed alkali solubility under the action of an acid comprises constitutional units represented by general formula (2) (wherein R<SB>1</SB>represents an alicyclic group having 20 or less carbon atoms; n represents 0 or an integer of 1-5; and R<SB>2</SB>represents a hydrogen atom, a fluorine atom, a 1-20C lower alkyl group, or a fluorinated 1-20C lower alkyl group) and general formula (4) (wherein R<SB>2</SB>is the same as that of formula (2); X' represents a divalent or trivalent cyclic group; Y represents a divalent 1-6C alkylene or alkyleneoxy group, p and q each independently represent an integer of 1-5; and s represents an integer of 1 or 2). <P>COPYRIGHT: (C)2011,JPO&INPIT |
