| 摘要 |
PROBLEM TO BE SOLVED: To prevent degradation in a flux and intrusion of dust or the like into the flux, and to reduce the consumption of the flux while achieving reliable replacement of the flux with new one. SOLUTION: In the flux film deposition apparatus, a reference surface 102 in a flux table 100 is formed with a recess 104 having depth substantially same as the film thickness of a flux and for film deposition, and a flux container 110 with its bottom surface being opened is relatively moved horizontally on the the recess 104 for film deposition, thereby a flux 108 is filled into the recess 104 for film deposition. Bottom surfaces of a front portion 112 in the relatively moving direction of the flux container 110 and of the side surface part 114 are tightly adhered to the reference surface 102 of the flux table 100, and a bottom surface of a rear portion in the relatively moving direction of the flux container is substantially tightly adhered to a bottom surface 106 of the recess 104 for film deposition. COPYRIGHT: (C)2007,JPO&INPIT |
