发明名称 SOID-STATE IMAGING ELEMENT
摘要 PROBLEM TO BE SOLVED: To improve precision of a signal obtained by each pixel cell by reducing a leak of stored electric charges due to X-ray irradiation. SOLUTION: Each pixel cell 3 uses a P channel MOSFET with an octagonal structure as an MOSFET 13 for a reset switch for initializing the potential of a charge storage portion 12. Even when positive electric charges are stored in a gate oxide film by irradiation with X rays, the P channel MOSFET has no false channel formed right below the gate oxide film and can reduce a leak through a channel as compared with an N channel MOSFET. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009004682(A) 申请公布日期 2009.01.08
申请号 JP20070166163 申请日期 2007.06.25
申请人 SHIMADZU CORP 发明人 ITO YASUNOBU;SAKAUCHI HISAFUMI;ARAKAWA AKIRA
分类号 H01L27/14;H01L27/146 主分类号 H01L27/14
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