发明名称 POLYAMIC ACIDS, POLYIMIDES, AND PROCESSES FOR THE PRODUCTION THEREOF
摘要 <p>Polyamic acids and polyimides, which exhibit high light transmittance, high heat resistance of thermal decomposition temperatures of 300°C or above, excellent solvent solubility, and improved processability. Specifically, polyamic acids comprising repeating units represented by the general formula [1], characterized in that at least 10 % by mole of moieties A have a structure represented by the general formula [2]; or polyimides obtained by the cyclodehydration of the polyamic acids: [1] [wherein A is a tetravalent organic group; B is a divalent organic group; and n is a positive integer] [2] [wherein R&lt;SUP&gt;1&lt;/SUP&gt; and R&lt;SUP&gt;2&lt;/SUP&gt; are each independently hydrogen, halogeno, alkyl of 1 to 10 carbon atoms, haloalkyl of 1 to 10 carbon atoms, cycloalkyl of 3 to 8 carbon atoms, phenyl, or cyano; and a1 to a4 represent binding sites in the general formula [1], with the proviso that a1 and a3 must not simultaneously attach to the carboxyl groups and a2 and a4 must not simultaneously attach to the carboxyl groups].</p>
申请公布号 WO2006104038(A1) 申请公布日期 2006.10.05
申请号 WO2006JP305972 申请日期 2006.03.24
申请人 NISSAN CHEMICAL INDUSTRIES, LTD.;SUZUKI, HIDEO;TAMURA, TAKAYUKI 发明人 SUZUKI, HIDEO;TAMURA, TAKAYUKI
分类号 C08G73/10 主分类号 C08G73/10
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