| 发明名称 |
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS |
| 摘要 |
A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers under such illumination that the quantity of light of wavelength up to 400 nm is up to 0.05 mW/cm2. The polymer avoids photo-decomposition of the acid generator during polymerization and concomitant deprotection reaction of the acid labile group when used in positive resist compositions. A pattern with high dissolution contrast and rectangularity is formed after development. |
| 申请公布号 |
US2016168296(A1) |
申请公布日期 |
2016.06.16 |
| 申请号 |
US201514960978 |
申请日期 |
2015.12.07 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
Hatakeyama Jun;Funatsu Kenji;Adachi Teppei |
| 分类号 |
C08F224/00;G03F7/32;C08F216/10;G03F7/16;G03F7/20;C08F236/20;G03F7/039;C08F220/68 |
主分类号 |
C08F224/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units of at least one type selected from recurring units having a carboxyl group optionally substituted with an acid labile group and recurring units having a hydroxyl group optionally substituted with an acid labile group, said polymer being obtained from polymerization of monomers corresponding to the recurring units under such illumination that the quantity of light of wavelength up to 400 nm is 0.05 mW/cm2 or less. |
| 地址 |
Tokyo JP |
