| 摘要 |
<p>A method and an apparatus for measuring the depth of a home pattern are provided to obtain precisely the thickness of a film by comparing measurement and theory spectral reflectance. An apparatus for measuring the depth of a home pattern includes a supporting unit(21), a light radiating unit(3), an optical unit(4), a spectroscope(5), a detecting unit(6), and a calculating unit(71). The supporting unit supports a substrate formed a home pattern in a measuring area. The light radiating unit radiates lights into the substrate. The optical unit guides the reflective lights of the lights reflected from the substrate. The spectroscope, which includes a grating, receives and divides the reflective lights using the grating. The detecting unit receives the divided reflective lights and obtains measurement spectral reflectance in the measuring area. The calculating unit determines parameters related to the home pattern by comparing theory spectral reflectance obtained by calculation based on the parameters with the measurement spectral reflectance.</p> |
