| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition with sufficiently improved pattern collapse performance, and to provide a pattern forming method using the resist composition. <P>SOLUTION: The positive resist composition contains (A) a compound which generates an acid by irradiation with active rays or radiation, (B) a resin the solubility of which in an alkali developing solution is increased by an action of an acid, and (C) a specified nitrogen-containing compound having an ester moiety and an oxyalkylene moiety. The pattern forming method is carried out by using the above resist composition. <P>COPYRIGHT: (C)2007,JPO&INPIT |
