EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR CONTROLLING EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of excellently performing exposure processing, by suppressing influence on devices and members in a periphery of a substrate caused by leakage of liquid forming a liquid immersion area.

SOLUTION: An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and liquid. The exposure apparatus has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops supply of the liquid when abnormality is detected.

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