SPATTER DEVICE AND SPATTER FILM FORMING METHOD

摘要

A spatter device and a spatter film forming method; the carousel type spatter device, comprising a substrate holder installed in the chamber thereof; the spatter film forming method, comprising the steps of installing a normal magnetron and an AC magnetron for low and high refractive index film formations, forming a film by the AC magnetron up to 90% of a design film thickness, and forming the film by only the normal magnetron, whereby an accurate film thickness control can be performed, and an excellent productivity can be provided.