| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress a blowout or an oxidation degradation of a static charge eliminating part which captures charged particles in jetting gas of a plasma processing device and eliminates static charges of them, and to suppress yield from lowering. <P>SOLUTION: A conductive mesh having a larger area than that of a plasma jet aperture 12 or a static charge eliminating part 31 composed of a porous plate is provided between the jet aperture 12 of a plasma generating part 10 and a treating part 19. The static eliminating part 31 is electrically grounded through a ground line 33. The static eliminating part 31 is made to move by a transporting means composed of a pair of rolls 32, 32. <P>COPYRIGHT: (C)2010,JPO&INPIT |
