MASTER MOLD FOR IMPRINT AND MANUFACTURING METHOD THEREFOR, FILM MOLD FOR IMPRINT AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR WIRE GRID POLARIZER

摘要

PROBLEM TO BE SOLVED: To provide a master mold for imprint which prevents occurrence of a defect region in a molded material to be imprinted.SOLUTION: A film mold 71 for imprint includes a main part 82 having a main pattern region 72, and a peripheral part 83 having a peripheral region 73, where an uneven shape 92 is formed in the main pattern region 72. The height Ha' from a part or all of the back surface to the front surface of the peripheral part 83 is smaller than the main pattern protrusion height Hb' from the back surface of the main part 82 to the surface of a convex part 92B of the uneven shape 92 of the main pattern region 72, and larger than the main pattern recess height Hc' from the back surface of the main part 82 to the surface of a concave part 92A of the uneven shape 92 of the main pattern region 72.SELECTED DRAWING: Figure 5