发明名称 |
MANAGEMENT SYSTEM FOR APPROPRIATE EXPOSURE QUANTITY TO PHOTOSENSITIVE MATERIAL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a management system for appropriate exposure quantity to a photosensitive material by which checking and setting of the exposure quantity easy from an output machine to a photosensitive material is simplified and an appropriate exposure quantity can be determined without having special knowledge or techniques. <P>SOLUTION: The management system for an appropriate exposure quantity to a photosensitive material is equipped with: a non-contact IC chip having a production lot number recorded and mounted on the brand of a photosensitive material; a reader-writer terminal which reads the production lot number information recorded in the non-contact IC chip; an RIP (raster image processor) device which transmits the production lot number information in the non-contact IC chip read out by the reader-writer terminal and an output machine information recorded in the RIP device to a server computer and which receives the appropriate exposure quantity from the server computer and determines the exposure quantity based on the appropriate exposure quantity; and a data base and the server computer which receives and analyzes the production lot number information and the output machine information from the RIP device and transmits the appropriate exposure quantity. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005208381(A) |
申请公布日期 |
2005.08.04 |
申请号 |
JP20040015443 |
申请日期 |
2004.01.23 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
TAMURA YOSHIHIRO |
分类号 |
G03F7/20;G06K17/00;G06K19/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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