| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern excellent in a focus margin can be produced.SOLUTION: The resist composition comprises: a resin having a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group; an acid generator; and a salt that generates an acid having a lower acidity than that of the acid generated by the acid generator. In the formula, Rrepresents a hydrogen atom or a methyl group; Rto Reach independently represent a hydrogen atom, a hydroxy group, or a hydrocarbon group having 1 to 12 carbon atoms, in which -CH- included in the hydrocarbon group may be replaced by -O- or -CO-, or two groups or more in Rto Rmay be bonded to form a ring; m and n each independently represent an integer of 0 to 5; and Arepresents a single bond, a divalent hydrocarbon group having 1 to 12 carbon atoms, or the like.SELECTED DRAWING: None |
