发明名称 Method for providing a perpendicular magnetic recording head
摘要 A method provides a PMR transducer. In one aspect, the method includes forming a trench in an intermediate layer using reactive ion etch(es). The trench top is wider than its bottom. In this aspect, the method also includes providing a seed layer using atomic layer deposition and providing a PMR pole on the seed layer. Portion(s) of the seed layer and PMR pole reside in the trench. In another aspect, the method includes providing a mask including a trench having a top wider than its bottom. In this aspect, the method includes providing mask material in the trench, providing an intermediate layer on the mask material and removing the mask material to provide another trench in the intermediate layer. In this aspect, the method also includes providing a PMR pole in the additional trench.
申请公布号 US8793866(B1) 申请公布日期 2014.08.05
申请号 US200711960596 申请日期 2007.12.19
申请人 Western Digital (Fremont), LLC 发明人 Zhang Jinqiu;Hong Liubo;Shen Yong;Wang Yizhong;Sun Hai;He Li
分类号 G11B5/187;C23C14/22 主分类号 G11B5/187
代理机构 代理人
主权项 1. A method for providing a perpendicular magnetic recording (PMR) transducer including an intermediate layer, the method comprising: forming a trench in the intermediate layer using at least one reactive ion etch, the trench having a bottom and a top wider than the bottom, the step of providing the trench further including providing at least one layer on the intermediate layer; and forming an aperture in the at least one layer using a first reactive ion etch of the at least one reactive ion etch, the aperture having an aperture top and an aperture bottom substantially the same as the aperture top such that the aperture has substantially vertical sidewalls; providing a seed layer using atomic layer deposition, at least a portion of the seed layer residing in the trench and in the aperture formed in the at least one layer; and providing a PMR pole on the seed layer, at least a portion of the PMR pole residing in the trench, the PMR pole having at least one sidewall having a vertical portion corresponding to the aperture and an angled portion corresponding to the trench.
地址 Fremont CA US