| 摘要 |
PROBLEM TO BE SOLVED: To provide an unexposed original disk for an optical recording medium wherein formation of a pit pattern and a groove is facilitated while the constitution of an exposure device, condition determination before exposure and exposure machine operation during exposure are simplified at a reduced cost, to provide its exposure method and to provide an undeveloped original disk for the optical recording medium obtained by the exposure. SOLUTION: (1) The unexposed original disk for the optical recording medium wherein a first photoresist layer, an intermediate layer consisting of an oxide film and a second photoresist layer are sequentially laminated on a substrate has a pre-development treatment region at a part in its surface. (2) In the unexposed original disk for the optical recording medium mentioned in (1), the pre-development treatment region is provided in a concentric shape. (3) In the undeveloped original disk for the optical recording medium wherein the first photoresist layer, the intermediate layer consisting of the oxide film and the second photoresist layer are sequentially laminated on the substrate, a groove (guide groove) and a pit pattern are exposed in the pre-development treatment region provided at a part in its surface and in a region (a non-pre-development treatment region) except the pre-development treatment region, respectively. COPYRIGHT: (C)2007,JPO&INPIT
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