| 摘要 |
An X-ray fluorescence analyzing system includes: a cassette (3) in which a substrate (1) is housed; a vapor phase decomposing device (20) for dissolving and then drying a measurement object (2) on a sample substrate surface (11a) to be held thereon; at least one measurement substrate (12); a sample recovering device (30) for dripping and drying a recovery liquid (4), which has recovered the measurement object (2) from the sample substrate (11), onto a predetermined dripping position on a measurement substrate surface (12a) to hold the recovery liquid (4) thereon; an X-ray fluorescence spectrometer (40); a conveying device (50) for conveying the substrate (1); and a control device (60) for controlling the devices (20, 30, 40, 50). The recovery liquids (4) of the measurement objects (2) from a plurality of the sample substrates (11) are dripped and dried on the single measurement substrate surface (12a) to be measured. |
| 主权项 |
1. An X-ray fluorescence analyzing system comprising:
a cassette in which a sample substrate and a measurement substrate are to be housed; a vapor phase decomposing device configured to dissolve, by using a reactive gas, and then dry a measurement object existing on a sample substrate surface, or a measurement object existing on a surface of, or within, a film formed on the sample substrate surface to hold the measurement object on the sample substrate surface; at least one measurement substrate; a sample recovering device configured to drip a solution on the sample substrate having the measurement object existing on the surface thereof, move the solution on the sample substrate surface while holding the solution with a holder, suction and hold, by a suction mechanism attached to the holder, a recovery liquid that has recovered the measurement object from the sample substrate surface, and drip, from the suction mechanism onto a predetermined dripping position on a surface of the measurement substrate, and dry the recovery liquid to hold the measurement object on the surface of the measurement substrate; an X-ray fluorescence spectrometer that has a substrate movement unit including an r-stage configured to move a substrate linearly in a direction along a surface thereof and a θ-stage configured to rotate the substrate about a normal line of the surface thereof, and that is configured to emit primary X-rays on the measurement object held on the surface of the measurement substrate positioned by the substrate movement unit and measure an intensity of generated fluorescent X-rays; a conveying device configured to convey the sample substrate from the cassette to the vapor phase decomposing device, from the vapor phase decomposing device to the sample recovering device, and from the sample recovering device to the cassette, and convey the measurement substrate from the cassette to the sample recovering device, from the sample recovering device to the cassette, from the sample recovering device to the X-ray fluorescence spectrometer, and from the X-ray fluorescence spectrometer to the cassette; and a control device configured to control the vapor phase decomposing device, the sample recovering device, the X-ray fluorescence spectrometer, and the conveying device; the X-ray fluorescence analyzing system being configured to drip the recovery liquids of the measurement objects obtained from a plurality of the sample substrates onto a plurality of the predetermined dripping positions, corresponding to the plurality of the sample substrates, on the surface of the single measurement substrate, then dry the recovery liquids, and measure the measurement objects, and the predetermined dripping positions each being a diffracted X-ray avoidance position that is stored in the control device in advance and at which generation of diffracted X-rays is avoidable on the measurement substrate. |
