发明名称 Process for surface modification of particulate solids
摘要 Improved utilization of organosilicon compounds in hydrophobicizing finely divided particulate solids is accomplished by metering a partial amount of unreacted solids with organosilicon containing offgases derived from admixing and reacting a major portion of solids with organosilicon compounds and admixing the offgas-treated solids with the major portion of solids to be treated.
申请公布号 US9527874(B2) 申请公布日期 2016.12.27
申请号 US201314381107 申请日期 2013.03.05
申请人 Wacker Chemie AG 发明人 Gottschalk-Gaudig Torsten;Ehrke Carl-Heinz;Maginot Helmut
分类号 C01B33/159;C07F7/18;C09C3/12;C09C1/30;C07F7/12 主分类号 C01B33/159
代理机构 Brooks Kushman P.C. 代理人 Brooks Kushman P.C.
主权项 1. A process for producing surface modified particulate finely divided solid F having a BET surface area of from 0.1 m2/g to 1000 m2/g, comprising the steps of: (A) mixing a first amount of unmodified finely divided solid F1 with organosilicon compound(s) to form a first mixture of F1 and organosilicon compound(s) and producing an offgas comprising organosilicon compound(s); (B) reacting the mixture of unmodified finely divided solid F1 with organosilicon compound(s) to produce surface modified finely divided solid F with or without an offgas comprising organosilicon compound(s); (C) freeing the surface modified finely divided solid F from step (B) of adsorbed byproducts and unconverted organosilicon compound(s) which are obtained as offgas; (D) metering a second amount of unmodified finely divided solid F1 into the offgas obtained in process steps (A), (C) or (B) putting in upstream of a filter to mix the solid F1 with organosilicon compound(s) in the offgas to form a second mixture of F1 and organosilicon compound(s); and (E) feeding the second mixture obtained in process step (D) to process step (A) to augment the first mixture of unmodified finely divided solid F1 and organosilicon compound(s).
地址 Munich DE