SUBSTRATE HOLDING DEVICE, FILM FORMING APPARATUS AND SUBSTRATE HOLDING METHOD

摘要

Provided is a substrate holding device which is capable of ensuring adhesion between a mask and a substrate. This substrate holding device 30 is provided with: a mask plate 311; an intermediate plate 32; a holding plate 33; and a pressing mechanism 34. The mask plate 311 is configured from a magnetic material. The intermediate plate 32 comprises a first surface facing the mask plate 311 and a second surface that is on the reverse side of the first surface, and is configured such that the first surface is able to come into contact with a substrate W that is arranged on the mask plate 311. The holding plate 33 supports the intermediate plate 32 in such a manner that the intermediate plate 32 is relatively movable in an axial direction that is perpendicular to the mask plate 311, and comprises a magnet 331 which is configured so as to be capable of magnetically sucking the mask plate 311, with the intermediate plate 32 and the substrate W being interposed therebetween. The pressing mechanism 34 is arranged so as to face the second surface, and is configured so as to be capable of pressing at least a part of the second surface in the above-described axial direction.