| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus advantageous in both patterning accuracy and throughput.SOLUTION: The lithographic apparatus is to form a pattern with a plurality of beams and includes: a measurement part for measuring characteristics of at least part of the plurality of beams; a blocking part for blocking part of the plurality of beams; and control part for blocking with the blocking part a part of the plurality of beams on the basis of information on accuracy required for the pattern formation and an output of the measurement part.SELECTED DRAWING: Figure 2 |
