发明名称 Bi-Directional Double-Pass Multi-Beam Writing
摘要 To irradiate a target with a beam of energetic electrically charged particles, the beam is formed and imaged onto a target, where it generates a pattern image composed of pixels. The pattern image is moved along a path on the target over a region to be exposed, and this movement defines a number of stripes covering said region in sequential exposures and having respective widths. The number of stripes is written in at least two sweeps which each have a respective general direction, but the general direction is different for different sweeps, e.g. perpendicular to each other. Each stripe belongs to exactly one sweep and runs substantially parallel to the other stripes of the same sweep, namely, along the respective general direction. For each sweep the widths, as measured across said main direction, of the stripes of one sweep combine into a cover of the total width of the region.
申请公布号 US2016276131(A1) 申请公布日期 2016.09.22
申请号 US201615073935 申请日期 2016.03.18
申请人 IMS Nanofabrication AG 发明人 Platzgummer Elmar
分类号 H01J37/302;H01J37/20;H01J37/317 主分类号 H01J37/302
代理机构 代理人
主权项 1. A method for irradiating a target with a beam of energetic radiation formed by electrically charged particles, comprising: providing a pattern definition device having a plurality of apertures transparent to said radiation, illuminating said pattern definition device using an illuminating wide beam, which traverses the pattern definition device through said apertures thus forming a patterned beam consisting of a corresponding plurality of beamlets, forming said patterned beam into a pattern image on the location of the target, said pattern image comprising the images of at least part of the plurality of apertures covering a number of pattern pixels on the target, and generating a relative movement between said target and the pattern definition device producing a movement of said pattern image on the target along a path over a region where a beam exposure is to be performed, said path being composed of sections which each extend along a general direction, said region being composed of a plurality of pattern pixels arranged in a regular arrangement and said region having a total width as measured across said general direction, the movement along said path defining a number of stripes covering said region in sequential exposures,wherein the number of stripes are written in at least two sweeps, each sweep having a respective general direction, and the general direction being changed between sweeps,wherein each stripe belongs to exactly one of said sweeps,wherein the stripes in each sweep run substantially parallel to each other along the respective general direction, the stripes having respective widths as measured across said main direction, and for each sweep the widths of the stripes of one sweep combining into a cover of the total width.
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