发明名称 PLASMA PROCESSING SYSTEM WITH DIRECT OUTLET TOROIDAL PLASMA SOURCE
摘要 A plasma processing system includes a process chamber and a plasma source that generates a plasma in a plasma cavity. The plasma cavity is substantially symmetric about a toroidal axis. The plasma source defines a plurality of outlet apertures on a first axial side of the plasma cavity Plasma products produced by the plasma pass in the axial direction, through the plurality of outlet apertures, from the plasma cavity toward the process chamber. A method of plasma processing includes generating a plasma within a substantially toroidal plasma cavity that defines a toroidal axis, to form plasma products, and distributing the plasma products to a process chamber through a plurality of outlet openings substantially azimuthally distributed about a first axial side of the plasma cavity, directly into a process chamber.
申请公布号 US2016163513(A1) 申请公布日期 2016.06.09
申请号 US201414565077 申请日期 2014.12.09
申请人 Applied Materials, Inc. 发明人 LUBOMIRSKY DMITRY
分类号 H01J37/32;H01L21/3065 主分类号 H01J37/32
代理机构 代理人
主权项 1. A plasma processing system, comprising: a process chamber; and a plasma source that generates a plasma in a plasma cavity, the plasma cavity being substantially radially symmetric about a toroidal axis,the plasma source defining a plurality of outlet apertures on a first axial side of the plasma cavity, wherein plasma products produced by the plasma pass in the axial direction, through the plurality of outlet apertures, from the plasma cavity toward the process chamber.
地址 Santa Clara CA US