发明名称 LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system.SOLUTION: The fluid handling structure is configured to supply and confine liquid between a projection system and one of (i) a substrate, (ii) the substrate table, (iii) a surface of the shutter member, and (iv) any combination selected from (i)-(iii). The surface of the shutter member adjoins and is coplanar with a surface of the table. The surfaces of the shutter member and the table may be separated by a gap. The fluid extraction system is configured to remove liquid from the gap.SELECTED DRAWING: Figure 12
申请公布号 JP2016224470(A) 申请公布日期 2016.12.28
申请号 JP20160190199 申请日期 2016.09.28
申请人 ASML NETHERLANDS BV 发明人 CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE;NICOLAAS TEN KATE;KEMPER NICOLAAS R;STAVENGA MARCO KOERT;EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA;RIEPEN MICHAEL;ELISSEEVA OLGA VLADIMIROVNA;WILFRED MATHIJS GUNTHER TIJMEN;VAN DER WEKKEN MICHAEL CHRISTIAAN
分类号 G03F7/20 主分类号 G03F7/20
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