发明名称 |
Positive resist composition and pattern formation method using the positive resist composition |
摘要 |
A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.
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申请公布号 |
EP1835343(A1) |
申请公布日期 |
2007.09.19 |
申请号 |
EP20070005242 |
申请日期 |
2007.03.14 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
IWATO, KAORU;KODAMA, KUNIHIKO;YOSHIDA, YUKO;YAMAMOTO, KEI |
分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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