RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER AND COMPOUND

摘要

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below:;;in which Ra1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra2 and Ra3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X− represents a counter anion.

主权项

1. A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, the composition comprising:
a base material component (A) whose solubility in a developing solution changes under the action of an acid; an acid generator component (B) which generates an acid upon exposure; and a photo-reactive quencher (D0) which contains a compound (D0-1) represented by general formula (d0) shown below: wherein Ra1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent, Ra2 and Ra3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent, and X− represents a counter anion.