| 摘要 |
<p>Radiation-sensitive composition for forming color layer on slit nozzle is provided to show high solvent re-solubility of the composition in dried condition, and prevent generation of bumping holes by comprising dipropyleneglycol dimethylether as principal component of a solvent contained in the composition. The composition includes (A) coloring agent, (B) alkaline soluble resin, (C) multi-functional monomer, (D) photo-polymerization initiator and (E) a solvent which comprises 5 to 40wt.% of dipropyleneglycol dimethylether to form a colored layer of a color filter. The solvent further includes 10 to 60wt.% of solvent with boiling point less than 150deg.C and 30 to 70wt.% of solvent with boiling point ranging for 150 to 180deg.C (excluding dipropyleneglycol dimethylether). The color filter is fabricated by the steps of: coating a substrate with the composition; exposing a part of the coating layer; developing the exposed coating layer; and heat-treating the coating layer.</p> |
