发明名称 ASSAY OF STAMPER FOR NANO-IMPRINTING
摘要 PROBLEM TO BE SOLVED: To provide a method to observe easily a defect of a stamper for imprinting with a minute unevenness structure that cycle is smaller than the wavelength of visible light.SOLUTION: In an observation method of a transcription surface of a replica copied from a die with a minute unevenness structure that cycle is smaller than the wavelength of visible light, the transcription surface which the minute unevenness structure is not copied to the transcription surface of the replica is observed.SELECTED DRAWING: Figure 1
申请公布号 JP2016210062(A) 申请公布日期 2016.12.15
申请号 JP20150094619 申请日期 2015.05.07
申请人 MITSUBISHI RAYON CO LTD 发明人 ONOMOTO HIROSHI
分类号 B29C59/02;G01N21/84;G01N21/95;H01L21/027 主分类号 B29C59/02
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