发明名称 PLASMA TREATER
摘要 PURPOSE:To absorb a surge and the like by the abnormal discharge of plasma, to inhibit the local potential fluctuation of the surface of a sample and to equalize ion-electron distribution on the surface of the sample by arranging an electrode insulated from a substrate electrode near the outer circumferential section of the sample. CONSTITUTION:An electrode 16 is mounted around a substrate electrode 5 so as to surround a sample 14. Consequently, a surge and the like by the abnormal discharge of plasma are absorbed by the electrode 16 disposed near the outer circumferential section of the sample, the partial potential fluctuation of the surface of the sample is inhibited by the presence of the electrode 16 and the potential of the surface of the sample 14 is kept constant, and locally high ion-electron distribution resulting from the line of magnetic force and the like is equalized approximately on the surface of the sample. Accordingly, damage generated in the sample can be reduced largely.
申请公布号 JPS62173723(A) 申请公布日期 1987.07.30
申请号 JP19860015385 申请日期 1986.01.27
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 MACHIDA KATSUYUKI;HASHIMOTO CHISATO;TADACHI CHIYOTO;OIKAWA HIDEO
分类号 H01L21/302;H01L21/3065;H01L21/31 主分类号 H01L21/302
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