Process for electroplating utilizing disubstituted ethane sulfonic compounds as electroplating auxiliaries and electroplating auxiliaries containing same

摘要

A process in which disubstituted ethane sulfonic compounds are employed as electroplating auxiliaries in electroplating. The compounds for use in combination with the claimed process have the general formula: <IMAGE> wherein, A represents a pyridinium radical <IMAGE> in which R1 and R2 denote hydrogen or an alkyl radical having 1 to 3 carbon atoms, or R1 and R2, together with the pyridinium radical, form a condensed six-membered aromatic ring; or, A represents a mercapto radical of the formula -S-R4, in which R4 denotes hydrogen or the group: <IMAGE> and R3 is an alkyl group having 1 to 4 carbon atoms. Also included within the scope of the present invention are alkali or ammonium salts of the compounds of the foregoing structural formula.