METHOD FOR CORRECTING PROJECTING DEFECT

摘要

PURPOSE:To correct a microprojecting defect with a laser correcting device by registering a region to be irradiated with a laser beam by directing the angle part of the region to be irradiated with the laser beam toward a normal pattern side and specifying the size of a rectangular aperture. CONSTITUTION:The angle part of the rectangular aperture for determining the region 4 to be irradiated with the laser beam is registered to the projecting defect part 3 projecting from the normal pattern and is directed toward the normal pattern part. The irradiation with the laser is performed by setting the size of the rectangular aperture in such a manner that residues do not remain at this region 4 to be irradiated. Namely, light shielding layer patterns 2 consisting essentially of chromium are formed by a lithography technique on a transparent silica glass substrate 1, by which the projecting defect 3 is made to remain after the formation of the photomask. The irradiation with the laser is, thereupon, so executed by holding the region 4 to be directly irradiated with the laser set by the aperture image as a fixed region and directing the angle part of the region 4 to be directly irradiated toward the normal pattern side in such a manner that the front end of the angle comes into contact with the end of the normal pattern part. The defect is thus removed.