发明名称 MASK STRUCTURE AND MANUFACTURE THEREOF, AND EXPOSURE APPARATUS AND DEVICE PRODUCTION METHOD USING THE SAME
摘要 <p>PURPOSE: To secure high position accuracy of a transfer pattern by providing a monomolecular film or a monomolecular accumulation film on an adhesive face between a holding frame for holding a support film and a reinforcing body for reinforcing the holding frame. CONSTITUTION: A reinforcing body 24 is a frame having a hole at an X-ray transmitting part and made of Si. A Langmuir-Blodgett film (LB film) 26 is formed on an Si substrate 21 to be a holding frame after cleaning. For example, two layers are accumulated by using behenic acid among straight chain saturated fatty acid. Since the Si substrate 21 after cleaning is hydrophobic, 26a. of a hydrophobic groups 26a1 and a hydrophilic group 26a2 of the LB film 26a on the first layer is formed on the substrate side. Further, a hydrophilic group 26a of a hydrophobic group 26b1 and the hydrophilic groups 26b2 of the LB film 26b on the second layer is accumulated on the hydrophilic 26a2 on the first layer. Thereafter, the reinforcing body 24 which has been cleaned in advance and the substrate 21 are overlaid while being positioned. Further preferably, an electric field is applied between the reinforcing body 24 and the Si substrate 21.</p>
申请公布号 JPH08236416(A) 申请公布日期 1996.09.13
申请号 JP19950033705 申请日期 1995.02.22
申请人 CANON INC 发明人 CHIBA KEIKO;AKAIKE MASATAKE;MATSUDA HIROSHI
分类号 G03F1/14;G03F1/16;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F1/14
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