MANUFACTURING METHOD FOR SILICON-BASED OPTOELECTRONIC SYSTEM

摘要

Provided is a manufacturing method for a silicon-based optoelectronic system. The silicon-based optoelectronic system comprises a first substrate. The manufacturing method comprises: forming an optical waveguide subarea and a modulator subarea on a first area (21) of the first substrate; forming a probe subarea on a second area of the first substrate; forming a dielectric layer (212) on the first substrate having the optical waveguide subarea, the modulator subarea, and the probe subarea; and microwave annealing at least the corresponding first area (21) having the dielectric layer, the optical waveguide subarea, and the modulator subarea or at least the corresponding second area having the dielectric layer and the probe subarea.