| 摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to decrease photolithography stages and to prevent the degradation in the aperture ratio of pixel parts at the time of patterning transparent conductive layers. SOLUTION: This process for production includes a stage for forming a first transparent conductive layer 9, a stage for forming a metallic layer 11 on the first transparent conductive layer 9, a stage for forming source wiring and connection electrodes 110 having a two-layered structure, a stage for forming a protective layer 13, a stage for forming an interlayer insulating film 15, a stage for forming contact holes 16 on the connection electrodes on the interlayer insulating film, a stage for forming first contact parts for connection of pixel electrodes to the connection electrodes, a stage for forming a second transparent conductive layer and a stage for forming the pixel electrodes by patterning the second transparent conductive layer.</p> |
