| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition whose line edge roughness and exposure margin are improved and a pattern forming method using the same. <P>SOLUTION: The photosensitive composition is disclosed which contains (A1) a compound which produces acid stronger than benzene sulfonic acid by irradiation with an active light beam or radiation and (A2) a compound which produces acid as weak as or weaker than benzene sulfonic acid by irradiation with an active light beam or radiation, and (B) resin which has a monocyclic or polycyclic hydrocarbon structure and repeating units originated from at least one kind of acrylic ester derivative, has 70 to 150°C glass transition temperature, and undergoes an increases in solubility to an alkali liquid developer through operation of acid, and the pattern forming method using the same is disclosed. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
