发明名称 POLYMERIZABLE IMIDE MONOMER, ITS PREPARATION METHOD AND PHOTOCURABLE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a novel useful polymerizable imide monomer capable of forming a heat-resistant photosensitive resin cured product which is excellent in adhesion property to a substrate, photocurability and heat resistance after curing and shows little shrinkage of a coating film after thermosetting, its preparation method and a photocurable composition. <P>SOLUTION: The photocurable composition contains (A) a polymerizable imide monomer of formula (1) (wherein R is a hydrogen atom or a methyl group), (B) a photosensitive polymer and (C) a photoinitiator. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005320411(A) 申请公布日期 2005.11.17
申请号 JP20040138647 申请日期 2004.05.07
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 KOJIMA YASUNORI
分类号 G03F7/027;C07D209/48;C08F20/36;H01L21/027 主分类号 G03F7/027
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