发明名称 Process for producing planar components
摘要 In a process for producing a plurality of planar components, an insulating layer which does not yet have the desired final thickness is first produced on the principal face of the semiconductor wafer that requires the insulating layer. The insulating layer initially applied is divided up into smaller areas in such a way that no stresses occur between the material of the insulating layer and that of the common semiconductor wafer. The insulating layer is then reinforced in one or more process steps until its final thickness is achieved.
申请公布号 DE3138340(A1) 申请公布日期 1983.04.14
申请号 DE19813138340 申请日期 1981.09.26
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH 发明人 HENTSCHEL,HANS;MROCZEK,WERNER
分类号 H01L21/033;H01L21/316;(IPC1-7):H01L21/95;H01L21/78;H01L21/31 主分类号 H01L21/033
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